Customer Enablement Series 2021

What’s New in NX 1953 Manufacturing Part 2

Join Saratech Manufacturing Engineer, Bud Evans, for our upcoming CES: What’s New in NX 1953 Manufacturing Part 2 on Thursday, June 17, 2021 at 11am PDT. 

During this session, we will finish exploring improvements made in the Manufacturing application of NX 1953.  Join us as we discuss each item and demonstrate some inside NX.


Attend this session to see updates including:

  • Operations can now be patterned using normal Pattern procedures.
  • The tool axis can now be displayed at the end points of each movement.
  • The new “Rough Turn Smooth” operation.



Saratech’s Customer Enablement Series (CES) – our bi-monthly, web-based learning program is designed to help engineers, designers, and Siemens Digital Industries Software users get the most out of their CAD, CAM, CAE, PLM software. Join our application engineers, Siemens software experts, and power users online the first and third Thursdays of each month to learn. There is no cost to attend and no strings attached. In 30 minutes or less (well, sometimes more), software experts will share tips, techniques, and knowledge that will help sharpen your skills.

For your convenience, you only need to register ONE time in 2021 for all sessions. We look forward to a great year!

    About Saratech

    Saratech is an engineering company focused on helping manufacturing companies of all sizes solve product development problems. Over half of our 90+ team members are degreed engineers and we use the technology we sell in our own production environment. Whether it’s design, analysis, data management, or manufacturing improvement, we get customers to where they need to be. We are headquartered in Southern CA with sales and technical staff supporting customers across the United States.

    Learn more

    Fill out the form below to register for our entire 2021 Customer Enablement Series.

    Please register at least 30 minutes prior to the session to ensure you will receive the join link in time.